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Wafer-Scale Fabrication of Al/MoS
2
/Poly-Si Memristors and Insight of Mechanism on the Resistive Switching
Kuan Sheng Li, Min Kun Huang, Yeong Her Wang,
Yuan Chieh Tseng
*
,
Chun Jung Su
*
*
此作品的通信作者
新世代功能性物質研究中心
奈米科學及工程學士學位學程
智慧半導體奈米系統技術研究中心
電子物理學系
研究成果
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同行評審
3
引文 斯高帕斯(Scopus)
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2
/Poly-Si Memristors and Insight of Mechanism on the Resistive Switching」主題。共同形成了獨特的指紋。
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Keyphrases
Poly-Si
100%
Molybdenite
100%
Resistive Switching
100%
Wafer Fabrication
100%
Memristor
100%
Resistive Switching Properties
50%
Ultrathin
25%
Grain Boundary
25%
Interfacial Layer
25%
Metal Electrode
25%
Memory Device
25%
Electrical Characterization
25%
2D Materials
25%
Low Resistance State
25%
High Resistance State
25%
Noble Metals
25%
Trap-assisted Tunneling
25%
Transport Mechanism
25%
MoS2 Film
25%
Si Structures
25%
Conduction Mechanism
25%
Ultra-high Density
25%
Operation Mechanism
25%
Ohmic Behavior
25%
Wafer-scale
25%
Schottky Emission
25%
High Temperature Regime
25%
Transfer Process
25%
Endurance Cycle
25%
Wafer Process
25%
Switching Ratio
25%
Filament Formation
25%
Film Layer
25%
Multilayer Film
25%
Sulfur Ions
25%
Ion Vacancy
25%
Polycrystalline MoS2
25%
Memristor Structures
25%
Material Science
Density
100%
Film
100%
Transfer Process
100%
Two-Dimensional Material
100%
Multilayer Film
100%
Grain Boundary
100%
Engineering
Resistive
100%
Polysilicon
100%
Molybdenum Disulfide
100%
Tunnel Construction
20%
Interfacial Layer
20%
Polycrystalline
20%
Transfer Process
20%
High Resistance State
20%
Transport Mechanism
20%
Multilayer Film
20%
Film Layer
20%
2D Material
20%