Wafer-level 3D integration technology

Steven J. Koester*, Albert M. Young, Roy R. Yu, Sampath Purushothaman, Kuan-Neng Chen, Douglas C. La Tulipe, Narender Rana, Leathen Shi, Matthew R. Wordeman, Edmund J. Sprogis

*此作品的通信作者

    研究成果: Review article同行評審

    169 引文 斯高帕斯(Scopus)

    摘要

    An overview of wafer-level three-dimensional (3D) integration technology is provided. The basic reasoning for pursuing 3D integration is presented, followed by a description of the possible process variations and integration schemes, as well as the process technology elements needed to implement 3D integrated circuits. Detailed descriptions of two wafer-level integration schemes implemented at IBM are given, and the challenges of bringing 3D integration into a production environment are discussed.

    原文English
    頁(從 - 到)583-597
    頁數15
    期刊IBM Journal of Research and Development
    52
    發行號6
    DOIs
    出版狀態Published - 2008

    指紋

    深入研究「Wafer-level 3D integration technology」主題。共同形成了獨特的指紋。

    引用此