Voltage scaling and temperature effects on drain leakage current degradation in a hot carrier stressed n-MOSFET
Ta-Hui Wang*, C. F. Hsu, L. P. Chiang, N. K. Zous, Tien-Sheng Chao, C. Y. Chang
*此作品的通信作者
研究成果: Conference article › 同行評審
1
引文
斯高帕斯（Scopus）