Very high κ and high density TiTaO MIM capacitors for analog and RF applications

K. C. Chiang*, Albert Chin, C. H. Lai, W. J. Chen, C. F. Cheng, B. F. Hung, C. C. Liao

*此作品的通信作者

研究成果: Conference article同行評審

43 引文 斯高帕斯(Scopus)

指紋

深入研究「Very high κ and high density TiTaO MIM capacitors for analog and RF applications」主題。共同形成了獨特的指紋。

Engineering & Materials Science