Using BCl 3 -based plasma to modify wet-etching pattern sapphire substrate for improving the growth of GaN-Based LEDs

Bo Wen Lin*, Chen Yi Niu, Cheng Yu Hsieh, Bau Ming Wang, Wen Ching Hsu, Ray Ming Lin, Yew-Chuhg Wu

*此作品的通信作者

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2 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Physics & Astronomy

Chemical Compounds