Trimethylchlorosilane treatment of ultralow dielectric constant material after photoresist removal processing

T. C. Chang*, Y. S. Mor, Po-Tsun Liu, T. M. Tsai, C. W. Chen, C. J. Chu, Fu-Ming Pan, W. Lur, S. M. Szeb

*此作品的通信作者

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25 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds