Transparent barrier coatings on flexible polyethersulfone substrates for moisture-resistant applications

D. S. Wuu; W. C. Lo; C. C. Chiang; H. B. Lin; L. S. Chang; Ray-Hua Horng; C. L. Huang; Y. J. Gao

doi:10.4028/0-87849-960-1.4017

Transparent barrier coatings on flexible polyethersulfone substrates for moisture-resistant applications

D. S. Wuu^*, W. C. Lo, C. C. Chiang, H. B. Lin, L. S. Chang, Ray-Hua Horng, C. L. Huang, Y. J. Gao

^*此作品的通信作者

電子研究所

研究成果 › 同行評審

1 引文斯高帕斯（Scopus）

摘要

Silicon nitride (SiN_X) and silicon oxide (SiO_X) films deposited on flexible polyethersulfone (PES) substrates by plasma-enhanced chemical vapor deposition have been investigated for water vapor transmission rate (WVTR) and oxygen transmission rate (OTR) barrier applications. Details of the NH₃/SiH₄ and N₂O/ SiH₄ flow ratio effects on the SiN_X and SiO_X properties in terms of transmittance, refractive index, surface morphologies, OTR and WVTR were investigated. Under optimum conditions, the WVTR and OTR for SiO_X/PES can be reduced from a level of 28 g/m²/day and 243 cc/m ²/day (bare substrate) to 0.15 g/m²/day and 0.25 cc/m ²/day. Furthermore, the WVTR and OTR for SiN_X/PES can be reduced to 0.01 g/m²/day and 0.01 cc/m²/day. The transparency of the barrier coatings can achieve over 80%. As a result of experiments, the deposition of SiO_X and SiN_X thin films on PES plastic substrates can resist the moisture and oxygen transmission sufficiently.

原文	English
頁（從 - 到）	4017-4020
頁數	4
期刊	Materials Science Forum
卷	475-479
發行號	V
DOIs	https://doi.org/10.4028/0-87849-960-1.4017
出版狀態	Published - 2005
事件	PRICM 5: The Fifth Pacific Rim International Conference on Advanced Materials and Processing - Beijing, 中國持續時間: 2 11月 2004 → 5 11月 2004

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@article{7b3788ac8ce64c19b6535692ec7942f3,

title = "Transparent barrier coatings on flexible polyethersulfone substrates for moisture-resistant applications",

abstract = "Silicon nitride (SiNX) and silicon oxide (SiOX) films deposited on flexible polyethersulfone (PES) substrates by plasma-enhanced chemical vapor deposition have been investigated for water vapor transmission rate (WVTR) and oxygen transmission rate (OTR) barrier applications. Details of the NH3/SiH4 and N2O/ SiH4 flow ratio effects on the SiNX and SiOX properties in terms of transmittance, refractive index, surface morphologies, OTR and WVTR were investigated. Under optimum conditions, the WVTR and OTR for SiOX/PES can be reduced from a level of 28 g/m2/day and 243 cc/m 2/day (bare substrate) to 0.15 g/m2/day and 0.25 cc/m 2/day. Furthermore, the WVTR and OTR for SiNX/PES can be reduced to 0.01 g/m2/day and 0.01 cc/m2/day. The transparency of the barrier coatings can achieve over 80%. As a result of experiments, the deposition of SiOX and SiNX thin films on PES plastic substrates can resist the moisture and oxygen transmission sufficiently.",

keywords = "PES, Silicon nitride, Silicon oxide, WVTR & OTR",

author = "Wuu, {D. S.} and Lo, {W. C.} and Chiang, {C. C.} and Lin, {H. B.} and Chang, {L. S.} and Ray-Hua Horng and Huang, {C. L.} and Gao, {Y. J.}",

year = "2005",

doi = "10.4028/0-87849-960-1.4017",

language = "English",

volume = "475-479",

pages = "4017--4020",

journal = "Materials Science Forum",

issn = "0255-5476",

publisher = "Trans Tech Publications Ltd.",

number = "V",

note = "PRICM 5: The Fifth Pacific Rim International Conference on Advanced Materials and Processing ; Conference date: 02-11-2004 Through 05-11-2004",

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TY - JOUR

T1 - Transparent barrier coatings on flexible polyethersulfone substrates for moisture-resistant applications

AU - Wuu, D. S.

AU - Lo, W. C.

AU - Chiang, C. C.

AU - Lin, H. B.

AU - Chang, L. S.

AU - Horng, Ray-Hua

AU - Huang, C. L.

AU - Gao, Y. J.

PY - 2005

Y1 - 2005

N2 - Silicon nitride (SiNX) and silicon oxide (SiOX) films deposited on flexible polyethersulfone (PES) substrates by plasma-enhanced chemical vapor deposition have been investigated for water vapor transmission rate (WVTR) and oxygen transmission rate (OTR) barrier applications. Details of the NH3/SiH4 and N2O/ SiH4 flow ratio effects on the SiNX and SiOX properties in terms of transmittance, refractive index, surface morphologies, OTR and WVTR were investigated. Under optimum conditions, the WVTR and OTR for SiOX/PES can be reduced from a level of 28 g/m2/day and 243 cc/m 2/day (bare substrate) to 0.15 g/m2/day and 0.25 cc/m 2/day. Furthermore, the WVTR and OTR for SiNX/PES can be reduced to 0.01 g/m2/day and 0.01 cc/m2/day. The transparency of the barrier coatings can achieve over 80%. As a result of experiments, the deposition of SiOX and SiNX thin films on PES plastic substrates can resist the moisture and oxygen transmission sufficiently.

AB - Silicon nitride (SiNX) and silicon oxide (SiOX) films deposited on flexible polyethersulfone (PES) substrates by plasma-enhanced chemical vapor deposition have been investigated for water vapor transmission rate (WVTR) and oxygen transmission rate (OTR) barrier applications. Details of the NH3/SiH4 and N2O/ SiH4 flow ratio effects on the SiNX and SiOX properties in terms of transmittance, refractive index, surface morphologies, OTR and WVTR were investigated. Under optimum conditions, the WVTR and OTR for SiOX/PES can be reduced from a level of 28 g/m2/day and 243 cc/m 2/day (bare substrate) to 0.15 g/m2/day and 0.25 cc/m 2/day. Furthermore, the WVTR and OTR for SiNX/PES can be reduced to 0.01 g/m2/day and 0.01 cc/m2/day. The transparency of the barrier coatings can achieve over 80%. As a result of experiments, the deposition of SiOX and SiNX thin films on PES plastic substrates can resist the moisture and oxygen transmission sufficiently.

KW - PES

KW - Silicon nitride

KW - Silicon oxide

KW - WVTR & OTR

UR - http://www.scopus.com/inward/record.url?scp=17044435946&partnerID=8YFLogxK

U2 - 10.4028/0-87849-960-1.4017

DO - 10.4028/0-87849-960-1.4017

M3 - Conference article

AN - SCOPUS:17044435946

SN - 0255-5476

VL - 475-479

SP - 4017

EP - 4020

JO - Materials Science Forum

JF - Materials Science Forum

IS - V

T2 - PRICM 5: The Fifth Pacific Rim International Conference on Advanced Materials and Processing

Y2 - 2 November 2004 through 5 November 2004

ER -

Transparent barrier coatings on flexible polyethersulfone substrates for moisture-resistant applications

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