Transparent barrier coatings for flexible organic light-emitting diode applications

Dong Sing Wuu*, Tsai Ning Chen, Chia Cheng Wu, Cheng Chung Chiang, Yung Pei Chen, Ray-Hua Horng, Fuh Shyang Juang

*此作品的通信作者

研究成果: Article同行評審

41 引文 斯高帕斯(Scopus)

摘要

Silicon oxide (SiOx) and silicon nitride (SiNx) thin films have been deposited onto flexible polycarbonate (PC) substrates using plasma-enhanced (PE)CVD for transparent barrier applications. Comparing the internal stress, optical transparency, surface roughness, and impermeability results, a multilayer composed of parylene/SiOx/SiN x...parylene/SiOx/SiNx (PON...PON) is deposited on PC substrates and the optimum thicknesses of the SiNx, SiO x, and parylene layers is determined. Under optimum conditions, the water vapor transmission rate (WVTR) and oxygen transmission rate (OTR) of SiOx(50 nm)/SiNx(50 nm) barrier coatings on PC at 80°C decreases to values near 0.01 g m-2 per day and 0.1 cm3 m-2 per day, respectively. To further reduce the WVTR and OTR values, parylene layers are used as a smoothing, defect-decoupling, and protective medium in the multilayer. It has been found that organic light-emitting diodes capped with double PON layers show no dark spots and exhibit better emissions than single PON layers after 100 h at 25°C, and 40 % relative humidity.

原文English
頁(從 - 到)220-224
頁數5
期刊Chemical Vapor Deposition
12
發行號4
DOIs
出版狀態Published - 4月 2006

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