Time-Dependent Dielectric Breakdown of Gate Oxide on 4H-SiC with Different Oxidation and Isolation Processes

Yun Ju Wang, Yi Ting Huang, Bing Yue Tsui*, Chao Hsin Chien

*此作品的通信作者

研究成果: Conference contribution同行評審

1 引文 斯高帕斯(Scopus)

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Engineering & Materials Science