@article{029e5ddac7204d30a4883b43af6cec5b,
title = "Thickness determination of poly-Si/poly-oxide/poly-Si/SiO2/Si structure by ellipsometer",
abstract = "An ellipsometry measurement method is proposed to measure the poly-Si/poly-oxide/poly-Si/SiO2/Si structure. The thickness of each layer in this structure can be easily obtained by a conventional ellipsometry measurement. The measured result is consistent with that of cross-sectional TEM.",
keywords = "Ellipsometry, Measurement, Thin films",
author = "Tien-Sheng Chao and Lee, {C. L.} and Lei, {T. F.}",
year = "1993",
month = jan,
day = "1",
doi = "10.1049/el:19930774",
language = "English",
volume = "29",
pages = "1157--1159",
journal = "Electronics Letters",
issn = "0013-5194",
publisher = "Institution of Engineering and Technology",
number = "13",
}