Thermal diffusivity in amorphous silicon carbon nitride thin films by the traveling wave technique

S. Chattopadhyay; L. C. Chen; C. T. Wu; K. H. Chen; J. S. Wu; Y. F. Chen; G. Lehmann; P. Hess

doi:10.1063/1.1386619

Thermal diffusivity in amorphous silicon carbon nitride thin films by the traveling wave technique

S. Chattopadhyay^*, L. C. Chen, C. T. Wu, K. H. Chen, J. S. Wu, Y. F. Chen, G. Lehmann, P. Hess

^*此作品的通信作者

生醫光電研究所

研究成果: Article › 同行評審

21 引文斯高帕斯（Scopus）

摘要

Thermal diffusivity of thin films of amorphous silicon carbon nitride, prepared by ion beam sputtering was studied by traveling wave technique. The change of thermal diffusivity with carbon content was reported in amorphous silicon carbon nitride samples. There was a decrease in diffusivity values for higher carbon concentrations. A similar variation was observed for the density of the films as a function of carbon content.

原文	English
頁（從 - 到）	332-334
頁數	3
期刊	Applied Physics Letters
卷	79
發行號	3
DOIs	https://doi.org/10.1063/1.1386619
出版狀態	Published - 16 7月 2001

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10.1063/1.1386619

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abstract = "Thermal diffusivity of thin films of amorphous silicon carbon nitride, prepared by ion beam sputtering was studied by traveling wave technique. The change of thermal diffusivity with carbon content was reported in amorphous silicon carbon nitride samples. There was a decrease in diffusivity values for higher carbon concentrations. A similar variation was observed for the density of the films as a function of carbon content.",

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AU - Chen, L. C.

AU - Wu, C. T.

AU - Chen, K. H.

AU - Wu, J. S.

AU - Chen, Y. F.

AU - Lehmann, G.

AU - Hess, P.

PY - 2001/7/16

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AB - Thermal diffusivity of thin films of amorphous silicon carbon nitride, prepared by ion beam sputtering was studied by traveling wave technique. The change of thermal diffusivity with carbon content was reported in amorphous silicon carbon nitride samples. There was a decrease in diffusivity values for higher carbon concentrations. A similar variation was observed for the density of the films as a function of carbon content.

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Thermal diffusivity in amorphous silicon carbon nitride thin films by the traveling wave technique

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