The novel improvement of low dielectric constant methylsilsesquioxane by N 2 O plasma treatment
T. C. Chang*, Po-Tsun Liu, Y. S. Mor, S. M. Sze, Y. L. Yang, M. S. Feng, Fu-Ming Pan, B. T. Dai, C. Y. Chang
*此作品的通信作者
研究成果: Article › 同行評審
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引文
斯高帕斯(Scopus)