The novel improvement of low dielectric constant methylsilsesquioxane by N 2 O plasma treatment

T. C. Chang*, Po-Tsun Liu, Y. S. Mor, S. M. Sze, Y. L. Yang, M. S. Feng, Fu-Ming Pan, B. T. Dai, C. Y. Chang

*此作品的通信作者

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65 引文 斯高帕斯(Scopus)

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Material Science