摘要
Micron-size V defects were found on the hydride vapor phase epitaxy grown GaN films. When the film thickness increased, the diameter of V defects increased, but the density of the defects decreased. The defect has six {1 1̄ 0 1} facets, which encircle to form a concave hexagonal pyramid. Its shape is similar to that of epitaxial lateral overgrowth (ELO) GaN crystal grown on a dot-patterned GaN underlying layer. Through the analysis of the growth mechanism of ELO GaN, the growth mechanism of the V defects was investigated.
原文 | American English |
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頁(從 - 到) | 397-400 |
頁數 | 4 |
期刊 | Materials Chemistry and Physics |
卷 | 80 |
發行號 | 2 |
DOIs | |
出版狀態 | Published - 26 5月 2003 |