The effects of low-pressure rapid thermal post-annealing on the properties of (Ba, Sr)TiO₃ thin films deposited by liquid source misted chemical deposition

Keyphrases

• Low Pressure 100%
• Post-annealing 100%
• BaSrTiO3 100%
• Chemical Deposition 100%
• Liquid Source 100%
• Surface Topography 25%
• Crystallinity 25%
• Atomic Force Microscopy 25%
• Order of Magnitude 25%
• Electrical Properties 25%
• Crystallization Temperature 25%
• Leakage Current Density 25%
• Assure 25%
• Dielectric Constant 25%
• Ba0.7Sr0.3TiO3 25%
• Annealing Process 25%
• Processing Temperature 25%
• C-V Measurement 25%
• X-ray Diffraction Spectra 25%
• Stepwise Annealing 25%
• Low Loss Tangent 25%
• Residual Contamination 25%
• Residual Organics 25%
• Pressure Process 25%
• Thermal Desorption Spectrum 25%

Engineering

• Chemical Deposition 100%
• Thin Films 100%
• Liquid Source 100%
• Surface Topography 50%
• Ray Diffraction 50%
• Crystallinity 50%
• Atomic Force Microscopy 50%
• Crystallization Temperature 50%
• Dielectrics 50%
• Annealing Process 50%
• Smoother Surface 50%
• Loss Tangent 50%
• Process Result 50%

Material Science

• Thin Films 100%
• Annealing 100%
• Density 33%
• X-Ray Diffraction 33%
• Desorption 33%
• Permittivity 33%
• Surface Topography 33%