The effect of x-ray irradiation on the novella type photoresist

Hsin Chiang You; Shao Hui Shieh; Shiang Jun Zhang; Fu-Hsiang Ko; Hsiung Min Lin; Shyh Chang Tsaur; Chin Che Lin

doi:10.1109/INEC.2010.5425037

The effect of x-ray irradiation on the novella type photoresist

Hsin Chiang You^*, Shao Hui Shieh, Shiang Jun Zhang, Fu-Hsiang Ko, Hsiung Min Lin, Shyh Chang Tsaur, Chin Che Lin

^*此作品的通信作者

奈米科技碩博班

研究成果: Conference contribution › 同行評審

原文	English
主出版物標題	INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
頁數	1
DOIs	https://doi.org/10.1109/INEC.2010.5425037
出版狀態	Published - 5 5月 2010
事件	2010 3rd International Nanoelectronics Conference, INEC 2010 - Hongkong, China 持續時間: 3 1月 2010 → 8 1月 2010

出版系列

名字	INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

Conference

Conference	2010 3rd International Nanoelectronics Conference, INEC 2010
國家/地區	China
城市	Hongkong
期間	3/01/10 → 8/01/10

存取文件

10.1109/INEC.2010.5425037

其它文件與鏈接

Link to publication in Scopus

引用此

You, H. C., Shieh, S. H., Zhang, S. J., Ko, F.-H., Lin, H. M., Tsaur, S. C., & Lin, C. C. (2010). The effect of x-ray irradiation on the novella type photoresist. 於 INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings 文章 5425037 (INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings). https://doi.org/10.1109/INEC.2010.5425037

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title = "The effect of x-ray irradiation on the novella type photoresist",

author = "You, {Hsin Chiang} and Shieh, {Shao Hui} and Zhang, {Shiang Jun} and Fu-Hsiang Ko and Lin, {Hsiung Min} and Tsaur, {Shyh Chang} and Lin, {Chin Che}",

year = "2010",

month = may,

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doi = "10.1109/INEC.2010.5425037",

language = "English",

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You, HC, Shieh, SH, Zhang, SJ, Ko, F-H, Lin, HM, Tsaur, SC & Lin, CC 2010, The effect of x-ray irradiation on the novella type photoresist. 於 INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings., 5425037, INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings, 2010 3rd International Nanoelectronics Conference, INEC 2010, Hongkong, China, 3/01/10. https://doi.org/10.1109/INEC.2010.5425037

TY - GEN

T1 - The effect of x-ray irradiation on the novella type photoresist

AU - You, Hsin Chiang

AU - Shieh, Shao Hui

AU - Zhang, Shiang Jun

AU - Ko, Fu-Hsiang

AU - Lin, Hsiung Min

AU - Tsaur, Shyh Chang

AU - Lin, Chin Che

PY - 2010/5/5

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DO - 10.1109/INEC.2010.5425037

M3 - Conference contribution

AN - SCOPUS:77951655856

SN - 9781424435449

T3 - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

BT - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

T2 - 2010 3rd International Nanoelectronics Conference, INEC 2010

Y2 - 3 January 2010 through 8 January 2010

ER -