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The effect of the geometry aspect ratio on the silicon ellipse-shaped surroundinggate field-effect transistor and circuit
Yi-Ming Li
*
, Chih Hong Hwang
*
此作品的通信作者
電機工程學系
研究成果
:
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42
引文 斯高帕斯(Scopus)
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Keyphrases
Field-effect Transistors
100%
Aspect Ratio
100%
Surrounding Gate
75%
High Performance
25%
Electrical Characteristics
25%
Simulation Techniques
25%
MOSFET
25%
Delay Time
25%
Analog Circuits
25%
Transient Response
25%
Three-dimensional (3D)
25%
Fabrication Methods
25%
Transistor
25%
Short Channel Effects
25%
Gate Structure
25%
Device Characteristics
25%
Circuit Configuration
25%
Gate Metal
25%
Charge-discharge
25%
Digital Applications
25%
Nanodevices
25%
3-dB Bandwidth
25%
Digital Circuits
25%
Fall Time
25%
Discharge Capability
25%
Round Shape
25%
Large Aspect Ratio
25%
Unity Gain Bandwidth
25%
Coupled Device-circuit Simulation
25%
Surrounding-gate MOSFET (SGMOSFET)
25%
Engineering
Field-Effect Transistor
100%
Aspect Ratio
100%
Metal-Oxide-Semiconductor Field-Effect Transistor
40%
Limitations
40%
Delay Time
20%
Transient Analysis
20%
Analog Circuit
20%
Fall Time
20%
Coupled Device
20%
Db Bandwidth
20%
Gain Bandwidth
20%
Simulation Technique
20%
Digital Electronics
20%
Material Science
Silicon
100%
Field Effect Transistor
100%
Electronic Circuit
100%
Metal-Oxide-Semiconductor Field-Effect Transistor
28%
Transistor
14%
Electrical Property
14%
Nanodevice
14%
Analogue Circuit
14%