Temterature dependence of the reactions of CH radicals with unsaturated hydrocarbons

Michael R. Berman*, J. W. Fleming, A. B. Harvey, Ming-Chang Lin

*此作品的通信作者

研究成果: Article同行評審

72 引文 斯高帕斯(Scopus)

摘要

The temperature dependences of the reactions of CH (X2Π) with several unsaturated hydrocarbons were studied. CH radicals were generated by multiple-photon dissociation of CHBr3 at 266 nm. The CH concentration was monitored by its laser-induced fluorescence at 430 nm. The rate constants for the reactions of CH with C2H2 and C2H4 were found to increase with decreasing temperature. These rate constants were measured between 171 and 657 and 160 and 652 K, respectively, and found to be kC2 H2 = (3.49 ± 0.42) × 10-10 exp [(61 ± 36)/T] and kC2H4 = (2.23 ± 0.27) × 10-10 exp [(173 ± 35)/T] cm3 molecule-1 s-1. The rate constant for reaction with benzene was found to be temperature independent in the range 297-674 K with kC6H6 = (4.3 ± 0.3) × 10-10 cm3 molecule-1 s-1. The rate constant for the reaction of CH + toluene was determined to be kC6H5CH3 = (5.0 ± 0.4)× 10-10 cm3 molecule-1 s-1. Comparison of these results with earlier room-temperature measurements which used 193 nm photolysis indicates that VUV photolysis of unsaturated hydrocarbon reactants could systematically affect those measured rate constants.

原文English
頁(從 - 到)27-33
頁數7
期刊Chemical Physics
73
發行號1-2
DOIs
出版狀態Published - 1 12月 1982

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