Temperature dependence of CH radical reactions with O2, NO, CO and CO2

M. R. Berman*, J. W. Fleming, A. B. Harvey, Ming-Chang Lin

*此作品的通信作者

研究成果: Article同行評審

79 引文 斯高帕斯(Scopus)

摘要

The temperature dependence of the reactions of CH radicals with NO, O2, CO2 and CO was studied in the range from 297 to 676K in 100 torr of Ar buffer gas using a two-laser, photolysis/probe technique. The CH radicals were generated by the multiphoton dissociation of CHBr3 at 266 nm and detected by LIF at 429.8 nm. The reactions of CH with No and O2 show very little temperature dependence with k=(1.9±0.3)×10-10 and k=(5.4 ±1.0)×10-11 cm3 molecule-1 s-1, respectively. The rate of reaction of CH with CO2 increases with increasing temperature and can be described in the temperature range studied by k =(5.7±0.9)×10-12exp[(-345±53)/T] cm3 molecule-1s-1. The reaction of CH with CO has a negative temperature coefficient and was also found to be pressure-dependent. The rate constant for the reaction in 100 torr of Ar buffer gas is k=(4.6±1.0) ×10-13 exp [(861±101)/T] cm3 molecule-1 s-1 in the temperature range studied. The rate constant at room temperature increases by a factor of 3 over the range of buffer gas pressure from 50 to 640 torr. These observations are explained in terms of a long-lived complex, the HC2O adduct.

原文English
頁(從 - 到)73-79
頁數7
期刊Symposium (International) on Combustion
19
發行號1
DOIs
出版狀態Published - 1 1月 1982

指紋

深入研究「Temperature dependence of CH radical reactions with O2, NO, CO and CO2」主題。共同形成了獨特的指紋。

引用此