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Temperature dependence of CH radical reactions with H
2
O and CH
2
O
S. Zabarnick
*
, J. W. Fleming,
Ming-Chang Lin
*
此作品的通信作者
應用化學系
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:
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引文 斯高帕斯(Scopus)
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O and CH
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O」主題。共同形成了獨特的指紋。
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Keyphrases
Formaldehyde
100%
Temperature Effect
100%
Radical Reactions
100%
CH Radical
100%
Temperature Range
50%
Room Temperature
50%
Total Pressure
50%
Arrhenius Expression
50%
Reaction Pathway
25%
Argon
25%
Laser Photolysis
25%
CHBr3
25%
Primary Response
25%
Multiphoton Dissociation
25%
Probing Techniques
25%
Rapid Decomposition
25%
Negative Activation Energy
25%
C-H Insertion
25%
Engineering
Torr
100%
Temperature Dependence
100%
Radical Reaction
100%
Room Temperature
66%
Temperature Range
66%
Arrhenius
66%
Activation Energy
33%
Energetics
33%
Chemistry
Ambient Reaction Temperature
100%
Radical Reaction
100%
Photolysis
50%
Energetics
50%
Argon
50%
Negative Activation Energy
50%
Reaction Path
50%
Collisional
50%
Physics
Temperature Dependence
100%
Room Temperature
100%
Energetics
50%
Activation Energy
50%
Photolysis
50%
Material Science
Activation Energy
100%
Photolysis
100%