Technologies Toward Three-Dimensional Brain-Mimicking IC Architecture

Albert Chin*, You Da Chen

*此作品的通信作者

研究成果: Conference contribution同行評審

10 引文 斯高帕斯(Scopus)

摘要

Although device downscaling will soon reach the quantum limit, the speed and power are still the hard challenges for advanced ICs. To address these speed and power issues, we pioneered the three-dimensional (3D) IC in 2004. In contrast to few interconnects of package-level 3D IC, device-level high-mobility nMOS on VLSI backend, unipolar nMOS logic with CMOS-like ultra-low DC power, narrow distribution RRAM, and high-speed ferroelectric nMOS memory are the enabling technologies toward brain-mimicking IC architecture.

原文English
主出版物標題2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
發行者Institute of Electrical and Electronics Engineers Inc.
頁面472-474
頁數3
ISBN(電子)9781538665084
DOIs
出版狀態Published - 3月 2019
事件2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 - Singapore, 新加坡
持續時間: 12 3月 201915 3月 2019

出版系列

名字2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

Conference

Conference2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
國家/地區新加坡
城市Singapore
期間12/03/1915/03/19

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