Systematical study of reliability issues in plasma-nitrided and thermally nitrided oxides for advanced dual-gate oxide p-channel metal-oxide-semiconductor field-effect transistors

Wen Cheng Lo*, Shien Yang Wu, Sun Jay Chang, Mu Chi Chiang, Chih Yung Lin, Tien-Sheng Chao, Chun Yen Chang

*此作品的通信作者

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2 引文 斯高帕斯（Scopus）

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Engineering & Materials Science

Physics & Astronomy