Surface potential and electric field mapping of p-well/n-well junction by secondary electron potential contrast and in-situ nanoprobe biasing

Jeng Han Lee*, Po-Tsun Liu, M. H. Wang, Y. T. Lin, Y. S. Huan, David Su

*此作品的通信作者

研究成果: Conference contribution同行評審

摘要

This study investigates the p-well/n-well junction by using secondary electron potential contrast (SEPC) with in-situ nanoprobe biasing. Experimental result demonstrated dopant contrast is restored after applying electricity in the junction nodes. Furthermore, the image contrast was converted to a voltage scale, allowing the junction surface potential and electric filed distribution to be identified. The proposed method demonstrates that an in-situ nanoprobe system is powerful in dopant area inspection in SEM, potentially contributing to an efficient method in analyzing site-specific failure in real circuits.

原文English
主出版物標題2012 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2012
頁面1-3
頁數3
DOIs
出版狀態Published - 7月 2012
事件2012 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2012 - Singapore, Singapore
持續時間: 2 7月 20126 7月 2012

出版系列

名字Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

Conference

Conference2012 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2012
國家/地區Singapore
城市Singapore
期間2/07/126/07/12

指紋

深入研究「Surface potential and electric field mapping of p-well/n-well junction by secondary electron potential contrast and in-situ nanoprobe biasing」主題。共同形成了獨特的指紋。

引用此