Suppression of Schottky leakage current in island-in amorphous silicon thin film transistors with the CuCuMg as source/drain metal

M. C. Wang, T. C. Chang*, Po-Tsun Liu, R. W. Xiao, L. F. Lin, Y. Y. Li, F. S. Huang, J. R. Chen

*此作品的通信作者

研究成果: Article › 同行評審

9 引文 斯高帕斯（Scopus）

指紋

深入研究「Suppression of Schottky leakage current in island-in amorphous silicon thin film transistors with the CuCuMg as source/drain metal」主題。共同形成了獨特的指紋。

Keyphrases

Material Science