@inproceedings{c9a13dfc8fb9447daff6f9ff6f375a84,
title = "Suppression of photo-bias instability of transparent amorphous indium oxide thin film transistors by in situ nitrogen doping",
abstract = " In this study, we analyzed the In 2 O 3 thin films with different nitrogen flow rate during sputtering as the transistor's channel layer. The electrical analysis including device's reliability and material analysis were both examined. ",
keywords = "Indium oxide, Nitrogen, Thin-film transistors",
author = "Chang, {Chih Hsiang} and Po-Tsun Liu and Tsai, {Yun Chu}",
year = "2015",
month = jan,
day = "1",
language = "English",
series = "Proceedings of the International Display Workshops",
publisher = "International Display Workshops",
pages = "623--625",
booktitle = "22nd International Display Workshops, IDW 2015",
note = "22nd International Display Workshops, IDW 2015 ; Conference date: 09-12-2015 Through 11-12-2015",
}
