Suppression of photo-bias instability of transparent amorphous indium oxide thin film transistors by in situ nitrogen doping

Chih Hsiang Chang, Po-Tsun Liu, Yun Chu Tsai

研究成果: Conference contribution同行評審

摘要

In this study, we analyzed the In2O3 thin films with different nitrogen flow rate during sputtering as the transistor's channel layer. The electrical analysis including device's reliability and material analysis were both examined.

原文English
主出版物標題22nd International Display Workshops, IDW 2015
發行者International Display Workshops
頁面623-625
頁數3
ISBN(電子)9781510845503
出版狀態Published - 2015
事件22nd International Display Workshops, IDW 2015 - Otsu, Japan
持續時間: 9 12月 201511 12月 2015

出版系列

名字Proceedings of the International Display Workshops
1
ISSN(列印)1883-2490

Conference

Conference22nd International Display Workshops, IDW 2015
國家/地區Japan
城市Otsu
期間9/12/1511/12/15

指紋

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