Suppression of interfacial reaction for HfO2 on silicon by pre-CF4 plasma treatment

Chao Sung Lai*, Woei Cherng Wu, Tien-Sheng Chao, Jian Hao Chen, Jer Chyi Wang, Li Lin Tay, Nelson Rowell

*此作品的通信作者

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39 引文 斯高帕斯(Scopus)

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Physics & Astronomy