Sub-15 nm linewidth gratings using roll-to-roll nanoimprinting and plasma trimming to fabricate flexible wire-grid polarizers with low colour shift

Chien Li Wu, Cheng Kuo Sung, Po Hung Yao, Cheng-Huan Chen

研究成果: Article同行評審

37 引文 斯高帕斯(Scopus)

摘要

Sub-15 nm-wide gratings with a high aspect ratio of up to 16:1 were fabricated using roll-to-roll nanoimprinting and plasma trimming to achieve high optical performance (up to 12 000:1 extinction ratio with an average transmittance of 82%) and low colour shift (transmittance variation less than 3%) flexible wire-grid polarizers for display applications. We applied two imprint platforms onto glass and plastic substrates to identify the optical properties and characteristics of each fabrication process. To enhance the tolerance, reproducibility, and optical performance of the process, the grating profile symmetry and varying residual layer thicknesses were precisely simulated and controlled to achieve the design targets.

原文English
文章編號265301
期刊Nanotechnology
24
發行號26
DOIs
出版狀態Published - 5 7月 2013

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