Study on transparent amorphous indium oxide thin film transistors technology

Chih Hsiang Chang, Yu Chia Lai, Yang Shun Fan, Che Chia Chang, Po-Tsun Liu

研究成果: Conference contribution同行評審

摘要

In this study, we analyzed the In 2 O 3 thin films with different oxygen flow rate during sputtering as the transistor's channel layer. The electrical analysis including device's reliability and material analysis were both examined.

原文English
主出版物標題Proceedings of the 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015
發行者Institute of Electrical and Electronics Engineers Inc.
頁面399-403
頁數5
ISBN(電子)9781479999286
DOIs
出版狀態Published - 6月 2015
事件22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015 - Hsinchu, Taiwan
持續時間: 29 6月 20152 7月 2015

出版系列

名字Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
2015-August

Conference

Conference22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015
國家/地區Taiwan
城市Hsinchu
期間29/06/152/07/15

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