Study on etching profile of nanoporous silica

Keyphrases

• Sidewall 100%
• Etching Rate 100%
• Organosilicate 100%
• Nanoporous Silica 100%
• Si-H Bonds 100%
• Etch Profile 100%
• H2 Plasma Treatment 100%
• Organosilicate Glass 100%
• Oxides 50%
• OH Bond 50%
• FTIR Spectra 50%
• Spectral Analysis 50%
• Plasma Treatment 50%
• O2 Plasma 50%
• Etching Process 50%
• H2 Plasma 50%
• Pattern Profiles 50%
• Plasma Ashing 50%
• Fluorocarbon Plasma 50%
• Nanoporous Silica Film 50%
• High Porosity 50%
• Etching Conditions 50%
• Porous Silica 50%
• Stress Evolution 50%
• Si-OH 50%
• Gelation 50%
• F-ratio 50%
• Hydrophobia 50%
• Reactive Etching 50%
• Polymerization Rate 50%

Material Science

• Silicon Dioxide 100%
• Film 66%
• Oxide Compound 33%
• Chemical Vapor Deposition 33%
• Oxidation Reaction 33%
• Polymerization 33%
• Surface (Surface Science) 33%