Study on different isolation technology on the performance of blue micro-LEDs array applications

Keyphrases

• Implantation Depth 100%
• Isolation Technology 100%
• Micro-LED Array 100%
• Metal-organic Chemical Vapor Deposition (MOCVD) 50%
• Dry Etching 50%
• Photolithography 50%
• Sapphire Substrate 50%
• N-GaN 50%
• Epilayer 50%
• Electrical Properties 50%
• External Quantum Efficiency 50%
• Leakage Current 50%
• Fabrication Methods 50%
• Light Output 50%
• GaN Layers 50%
• Series Resistance 50%
• Electrical Isolation 50%
• Wet Etching 50%
• Arsenic 50%
• Efficiency Droop 50%
• Varying Effects 50%
• Deposition Technology 50%
• Depth Profile 50%
• Electron Beam Evaporation 50%
• Forward Current 50%
• Multi-energy 50%
• Mesa Etching 50%
• Average Energy 50%
• Ion Implantation Technology 50%

Engineering

• Chemical Vapor Deposition 100%
• Vapor Deposition 100%
• Sapphire Substrate 100%
• External Quantum Efficiency 100%
• Light Output Power 100%
• Series Resistance 100%
• Electrical Isolation 100%
• Ion Implantation 100%
• Arsenic 100%
• Dry Etching 100%
• Optical Lithography 100%
• Efficiency Droop 100%
• Deposition Technology 100%
• Depth Profile 100%

Material Science

• Light-Emitting Diode 100%
• Dry Etching 25%
• Chemical Vapor Deposition 25%
• Sapphire 25%
• Epilayers 25%
• Ion Implantation 25%
• Wet Etching 25%
• Arsenic 25%