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Study of the band alignment between atomic-layer-deposited high-κ dielectrics and MoS
2
film
Yun Yan Chung, Ming Li Tsai, Yen Teng Ho,
Yuan Chieh Tseng
,
Chao Hsin Chien
*
*
此作品的通信作者
智慧半導體奈米系統技術研究中心
材料科學與工程學系
電子研究所
研究成果
:
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同行評審
5
引文 斯高帕斯(Scopus)
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2
film」主題。共同形成了獨特的指紋。
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Keyphrases
High-k Dielectric
100%
Dielectric Film
100%
MoS2 Film
100%
Band Alignment
100%
Atomic Layer Deposited
100%
HfO2
25%
TiO2-Al2O3
25%
Al2O3-ZrO2
25%
Atomic Force Microscopy
12%
Chemical Vapor Deposition
12%
X-ray Photoelectron Spectroscopy
12%
Cross-sectional Transmission Electron Microscopy
12%
Molybdenite
12%
Transmission Electron Microscopy Images
12%
Molybdenum Disulfide MoS2
12%
Atomic Layer Deposition
12%
Conduction Band Offset
12%
Physical Characterization
12%
Two Dimensional Materials
12%
Abrupt Interface
12%
Energy Level Alignment
12%
Valance Band Offset
12%
Complementary Metal Oxide Semiconductor Field Effect Transistor
12%
Field Effect Transistor Circuits
12%
Direct Deposition
12%
Top-Down Scheme
12%
Material Science
Film
100%
Dielectric Material
100%
Titanium Dioxide
25%
Al2O3
25%
Zirconia
25%
Transmission Electron Microscopy
12%
Chemical Vapor Deposition
12%
X-Ray Photoelectron Spectroscopy
12%
Electronic Circuit
12%
Metal-Oxide-Semiconductor Field-Effect Transistor
12%
Complementary Metal-Oxide-Semiconductor Device
12%
Molybdenum
12%
Two-Dimensional Material
12%
Band Offset
12%
Atomic Force Microscopy
12%