Study of crystallinity in μc-Si:H films deposited by cat-CVD for thin film solar cell applications

C. H. Hsu, Y. P. Hsu, F. H. Yao, Y. T. Huang, C. C. Tsai, Hsiao-Wen Zan, C. C. Bi, C. H. Lu, C. H. Yeh

研究成果: Conference contribution同行評審

1 引文 斯高帕斯(Scopus)

摘要

The crystallinity of the hydrogenated microcrystalline silicon (μc-Si:H) film was known to influence the solar cell efficiency greatly. Also hydrogen was found to play a critical role in controlling the crystallinity. Instead of employing conventional plasma deposition techniques, this work focused on using catalytic chemical vapor deposition (Cat-CVD) to study the effect of hydrogen dilution and the filament-to-substrate distance on the crystallinity, deposition rate, microstructure factor and electrical property of the μc-Si:H film. We found that the substrate material and structure can affect the crystallinity of the μc-Si:H film and the incubation effect. Comparing bare glass, TCO-coated glass, a-Si:H-coated glass and μc-Si:H-coated glass, the microcrystalline phase grows the fastest onto μc-Si:H surface, but the slowest onto a-Si:H surface. Surprisingly, the template effect lasted for more than a thousand atomic layers of silicon.

原文English
主出版物標題Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2010
頁面465-470
頁數6
DOIs
出版狀態Published - 24 12月 2010
事件2010 MRS Spring Meeting - San Francisco, CA, United States
持續時間: 5 4月 20109 4月 2010

出版系列

名字Materials Research Society Symposium Proceedings
1245
ISSN(列印)0272-9172

Conference

Conference2010 MRS Spring Meeting
國家/地區United States
城市San Francisco, CA
期間5/04/109/04/10

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