排序方式
Keyphrases
Amorphous InGaZnO (a-IGZO)
100%
Zinc Oxide Thin Films
100%
Plasma Treatment
100%
Oxide Thin-film Transistors
100%
InGaZnO Thin-film Transistors
100%
In Situ Hydrogen
100%
Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition
100%
Electrical Characteristics
33%
Solid State
33%
Electrical Properties
33%
Optical Properties
33%
Transistor Device
33%
Liquid Crystal Display
33%
Subthreshold Swing
33%
ZnO Film
33%
Flow Ratio
33%
Threshold Voltage
33%
Cost Reduction
33%
Atmospheric Pressure Plasma Jet
33%
Field-effect Mobility
33%
Shallow Donor
33%
Doped Zinc Oxide Film
33%
Flat Panel Display
33%
Oxide Semiconductor
33%
Vacuum System
33%
Thin Solid Films
33%
Hydrogen Plasma Treatment
33%
Hydrogen Donor
33%
Active Matrix Displays
33%
Indium-doped Zinc Oxide
33%
Transparent Conductive Materials
33%
GZO Thin Film
33%
Atmospheric Pressure PECVD
33%
Passivator
33%
Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Plasma Treatment
100%
Thin-Film Transistor
100%
Pressure Plasma
100%
Atmospheric Pressure
100%
Thin Films
25%
Conductive
25%
Liquid Crystal Display
25%
Oxide Film
25%
Electrical Stability
25%
Solid Film
25%
Flat Panel Display
25%
Oxide Semiconductor
25%
Material Science
Thin-Film Transistor
100%
Gallium
100%
Zinc Oxide
100%
Indium
100%
Plasma-Enhanced Chemical Vapor Deposition
100%
Thin Films
25%
Film
25%
Electrical Property
25%
Oxide Film
25%
Optical Property
25%
Liquid Crystal Display
25%
Oxide Semiconductor
25%
Chemical Engineering
Indium
100%
Plasma Enhanced Chemical Vapor Deposition
100%
Film
100%
Zinc Oxide
100%
Oxide Semiconductors
25%