Structural and electrical properties of high-k HoTiO₃ gate dielectrics

Keyphrases

• Gate Dielectric 100%
• Electrical Properties 100%
• Structural Properties 100%
• Annealing 50%
• Dielectric 50%
• Si(111) 50%
• Low Leakage Current 50%
• High Capacitance 50%
• Interface State Density 50%
• Reactive Co-sputtering 50%
• Small Densities 50%
• Hysteresis Voltage 50%
• Capacitance Value 50%
• Intrinsic Defects 50%

Material Science

• Dielectric Material 100%
• Density 33%
• Capacitance 33%
• Phase Composition 33%