Stress memorization technique (SMT) by selectively strained-nitride capping for sub-65nm high-performance strained-Si device application

Chien Hao Chen*, T. L. Lee, Tuo-Hung Hou, C. L. Chen, C. C. Chen, J. W. Hsu, K. L. Cheng, Y. H. Chiu, H. J. Tao, Y. Jin, C. H. Diaz, S. C. Chen, M. S. Liang

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    研究成果: Conference contribution › 同行評審

    133 引文 斯高帕斯（Scopus）

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    Engineering & Materials Science