Statistical methodology to identify optimal placement of on-chip process monitors for predicting fmax

Szu Pang Mu, Wen Hsiang Chang, Chia-Tso Chao, Yi Ming Wang, Ming Tung Chang, Min Hsiu Tsai

研究成果: Conference contribution同行評審

2 引文 斯高帕斯(Scopus)

摘要

In previous literatures, many approaches use ring oscillators or other process monitors to correlate the chip's maximum operating frequency (Fmax). But none of them focus on the placement of these on-chip process monitors (OPMs) on a chip. The placement will greatly influence the accuracy of a prediction model. In this paper, we first propose a simulation framework to sample a chip's Fmax and it's OPM result. These samples are used to develop our methodology of OPM placement and to verify the effectiveness of an OPM placement. Then, a model-fitting framework is presented to correlate the OPMs' result to chip's Fmax. Finally, we propose a methodology to idenify optimal placement of OPM for predicting Fmax. The experiments demonstrate the effectiveness of our methodology in both simulation and silicon data.

原文English
主出版物標題2016 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2016
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9781450344661
DOIs
出版狀態Published - 7 11月 2016
事件35th IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2016 - Austin, United States
持續時間: 7 11月 201610 11月 2016

出版系列

名字IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
07-10-November-2016
ISSN(列印)1092-3152

Conference

Conference35th IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2016
國家/地區United States
城市Austin
期間7/11/1610/11/16

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