摘要
A stacked-NMOS triggered silicon-controlled rectifier (SNTSCR) is proposed as the electrostatic discharge (ESD) clamp device to protect the mixed-voltage I/O buffers of CMOS ICs. This SNTSCR device is fully compatible to general CMOS processes without using the thick gate oxide to overcome the gate-oxide reliability issue. ESD robustness of the proposed SNTSCR device with different layout parameters has been investigated in a 0.35-μm CMOS process. The HBM ESD level of the mixed-voltage I/O buffer with the stacked-NMOS channel width of 120 μm can be obviously improved from the original ∼ 2 kV to be greater than 8 kV by this SNTSCR device with a device dimension of only 60 μm/035 μm.
原文 | English |
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頁(從 - 到) | 363-365 |
頁數 | 3 |
期刊 | IEEE Electron Device Letters |
卷 | 23 |
發行號 | 6 |
DOIs | |
出版狀態 | Published - 1 6月 2002 |