摘要
The V-shaped pit on Al-GaN by using the μ-PL and atomic force microscopy (AFM) was examined. The results showed that a specific defect-related band was introduced inside the V-pit region that gives rise to a dominant feature in μ-PL spectra. In addition, the V-pit-related levels were efficient relaxation channels for photoexcited carriers so that the new broader emission peak was enhanced significantly and the I nbe was suppressed.
原文 | English |
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頁(從 - 到) | 2172-2174 |
頁數 | 3 |
期刊 | Journal of Applied Physics |
卷 | 95 |
發行號 | 4 |
DOIs | |
出版狀態 | Published - 15 2月 2004 |