@inproceedings{e65a677a11724c6a912a74a679a07c47,
title = "SONOS memories with embedded silicon nanocrystals in nitride by in-situ deposition method",
abstract = "In this work, we have successfully demonstrated SONOS memories with embedded Si-NCs in silicon nitride by In-situ deposition method. The self-assembly silicon nanocrystals were in-situ deposited within the Si 3N4 storage layer by dissociation of dichlorosilane (SiH2Cl2) gas to a high density of 9 × 10 11 cm-2. This new structure exhibits larger memory windows for up to 6 V, better program/erase characteristics, and excellent data retention properties as compared to control device. In addition, this novel process is simple, low cost, and compatible to the standard complementary metal-oxide-semiconductor (CMOS) processes. This technology seems to be very promising for the advanced flash memory devices.",
keywords = "In-situ deposition, SONOS memory, Silicon nanocrystal",
author = "Wu, {Yi Hong} and Chiang, {Tsung Yu} and Liu, {Sheng Hsien} and Yang, {Wen Luh} and Tien-Sheng Chao and Chin, {Fun Tat}",
year = "2008",
doi = "10.1109/ICICDT.2008.4567277",
language = "English",
isbn = "9781424418114",
series = "Proceedings - 2008 IEEE International Conference on Integrated Circuit Design and Technology, ICICDT",
pages = "195--198",
booktitle = "Proceedings - 2008 IEEE International Conference on Integrated Circuit Design and Technology, ICICDT",
note = "IEEE International Conference on Integrated Circuit Design and Technology, ICICDT 2008 ; Conference date: 02-06-2008 Through 04-06-2008",
}