Single-fabrication-step Ge nanosphere/SiO2/SiGe heterostructures: A key enabler for realizing Ge MOS devices

P. H. Liao, K. P. Peng, Horng-Chih Lin, T. George, Pei-Wen Li

研究成果: Article同行評審

17 引文 斯高帕斯(Scopus)

指紋

深入研究「Single-fabrication-step Ge nanosphere/SiO2/SiGe heterostructures: A key enabler for realizing Ge MOS devices」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Chemical Compounds