Simulation and fabrication of amorphous silicon rib type arrayed waveguide grating

Wen Jen Liu; Yen Hsin Cheng; Stven Chen; I. Tsen Lai; Yin-Chieh Lai; Min Hang Weng; Yung Hui Shih; Chung Da Lee

doi:10.1117/12.590065

Simulation and fabrication of amorphous silicon rib type arrayed waveguide grating

Wen Jen Liu^*, Yen Hsin Cheng, Stven Chen, I. Tsen Lai, Yin-Chieh Lai, Min Hang Weng, Yung Hui Shih, Chung Da Lee

^*此作品的通信作者

光電工程學系

研究成果: Conference article › 同行評審

2 引文斯高帕斯（Scopus）

摘要

The simulation and fabrication of amorphous silicon silicon on Insulator-arrayed waveguide gratings (SOI-AWG) device with 59% extra high refractive index difference (δ) were investigated. The transmission spectrum of AWG's device indicated the insertion loss, crosstalk and side-lobe which were lower than -3.5dB, -25 dB and -45 dB. Selecting index of 3.5012 a-Si and 1.4482 SiO₂ as core and bottom cladding layers, with design parameters represented very low loss, crosstalk, and side-lobe transmission spectral by 2D and 3D simulations. Amorphous Si films optical measurements indicated, the refractive index and extinction coefficient of the a-Si films were variable during different argon/silane flow rate and operating vacuum pressure.

原文	English
文章編號	41
頁（從 - 到）	285-296
頁數	12
期刊	Proceedings of SPIE - The International Society for Optical Engineering
卷	5723
DOIs	https://doi.org/10.1117/12.590065
出版狀態	Published - 2005
事件	Optical Components and Materials II - San Jose, CA, 美國持續時間: 24 1月 2005 → 25 1月 2005

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10.1117/12.590065

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@article{b4edc606cffb4344ababe0dc40640cd7,

title = "Simulation and fabrication of amorphous silicon rib type arrayed waveguide grating",

abstract = "The simulation and fabrication of amorphous silicon silicon on Insulator-arrayed waveguide gratings (SOI-AWG) device with 59% extra high refractive index difference (δ) were investigated. The transmission spectrum of AWG's device indicated the insertion loss, crosstalk and side-lobe which were lower than -3.5dB, -25 dB and -45 dB. Selecting index of 3.5012 a-Si and 1.4482 SiO2 as core and bottom cladding layers, with design parameters represented very low loss, crosstalk, and side-lobe transmission spectral by 2D and 3D simulations. Amorphous Si films optical measurements indicated, the refractive index and extinction coefficient of the a-Si films were variable during different argon/silane flow rate and operating vacuum pressure.",

keywords = "Amorphous Silicon, Array Waveguide Grating (AWG), Beam Propagation Method (BPM), DWDM, Plasma Enhanced Chemical Vapor Deposition (PECVD), Silicon-on-Insulator (SOI)",

author = "Liu, {Wen Jen} and Cheng, {Yen Hsin} and Stven Chen and Lai, {I. Tsen} and Yin-Chieh Lai and Weng, {Min Hang} and Shih, {Yung Hui} and Lee, {Chung Da}",

year = "2005",

doi = "10.1117/12.590065",

language = "English",

volume = "5723",

pages = "285--296",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Optical Components and Materials II ; Conference date: 24-01-2005 Through 25-01-2005",

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TY - JOUR

T1 - Simulation and fabrication of amorphous silicon rib type arrayed waveguide grating

AU - Liu, Wen Jen

AU - Cheng, Yen Hsin

AU - Chen, Stven

AU - Lai, I. Tsen

AU - Lai, Yin-Chieh

AU - Weng, Min Hang

AU - Shih, Yung Hui

AU - Lee, Chung Da

PY - 2005

Y1 - 2005

N2 - The simulation and fabrication of amorphous silicon silicon on Insulator-arrayed waveguide gratings (SOI-AWG) device with 59% extra high refractive index difference (δ) were investigated. The transmission spectrum of AWG's device indicated the insertion loss, crosstalk and side-lobe which were lower than -3.5dB, -25 dB and -45 dB. Selecting index of 3.5012 a-Si and 1.4482 SiO2 as core and bottom cladding layers, with design parameters represented very low loss, crosstalk, and side-lobe transmission spectral by 2D and 3D simulations. Amorphous Si films optical measurements indicated, the refractive index and extinction coefficient of the a-Si films were variable during different argon/silane flow rate and operating vacuum pressure.

AB - The simulation and fabrication of amorphous silicon silicon on Insulator-arrayed waveguide gratings (SOI-AWG) device with 59% extra high refractive index difference (δ) were investigated. The transmission spectrum of AWG's device indicated the insertion loss, crosstalk and side-lobe which were lower than -3.5dB, -25 dB and -45 dB. Selecting index of 3.5012 a-Si and 1.4482 SiO2 as core and bottom cladding layers, with design parameters represented very low loss, crosstalk, and side-lobe transmission spectral by 2D and 3D simulations. Amorphous Si films optical measurements indicated, the refractive index and extinction coefficient of the a-Si films were variable during different argon/silane flow rate and operating vacuum pressure.

KW - Amorphous Silicon

KW - Array Waveguide Grating (AWG)

KW - Beam Propagation Method (BPM)

KW - DWDM

KW - Plasma Enhanced Chemical Vapor Deposition (PECVD)

KW - Silicon-on-Insulator (SOI)

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U2 - 10.1117/12.590065

DO - 10.1117/12.590065

M3 - Conference article

AN - SCOPUS:22044448875

SN - 0277-786X

VL - 5723

SP - 285

EP - 296

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 41

T2 - Optical Components and Materials II

Y2 - 24 January 2005 through 25 January 2005

ER -

Simulation and fabrication of amorphous silicon rib type arrayed waveguide grating

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