Silicon Oxycarbide Accelerated Chemical Vapor Deposition of Graphitic Networks on Ceramic Substrates for Thermal Management Enhancement

Paul D. Garman, Jared M. Johnson, Vishank Talesara, Hao Yang, Dan Zhang, Jose Castro, Wu Lu, Jinwoo Hwang, L. James Lee*

*此作品的通信作者

研究成果: Article同行評審

12 引文 斯高帕斯(Scopus)

摘要

Ceramic materials such as aluminum oxide (Al2O3) and aluminum nitride (AlN) are commonly implemented as heat sinks for a variety of applications. However, the thermal conductivity of these ceramics is too low to act as effective thermal management materials in power electronics applications. With high lateral thermal conductivity, graphitic films would be ideal materials to enhance the thermal management abilities of ceramics. Current direct chemical vapor deposition (CVD) methods can only grow several layers of graphene on ceramic substrates with poor adhesion to the substrate. We demonstrate a simple atmospheric pressure chemical vapor deposition (APCVD) method to deposit micrometer-scale graphitic networks directly on the surface of ceramics making use of dual silicon oxycarbide (SiOC) sources. The graphitic networks have good adhesion to aluminum oxide and can provide sufficient thermal mass combined with superior hear transfer properties for effective thermal management enhancement of ceramic substrates.

原文English
頁(從 - 到)452-458
頁數7
期刊ACS Applied Nano Materials
2
發行號1
DOIs
出版狀態Published - 25 1月 2019

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