Silicide films for archival optical storage

King-Ning Tu*, K. Y. Ahn, S. R. Herd

*此作品的通信作者

研究成果: Article同行評審

12 引文 斯高帕斯(Scopus)

摘要

We demonstrate here that bilayer films consisting of Si and transition metals with a layer thickness of 15-40 nm are promising materials for archival optical storage. They show a large optical reflectivity change before and after silicide formation, have a long lifetime at room temperature, and are nontoxic.

原文English
頁(從 - 到)927-929
頁數3
期刊Applied Physics Letters
39
發行號11
DOIs
出版狀態Published - 1 12月 1981

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