Si-containing crystalline carbon nitride derived from microwave plasma-enhanced chemical vapor deposition

L. C. Chen*, D. M. Bhusari, C. Y. Yang, K. H. Chen, T. J. Chuang, Ming-Chang Lin, C. K. Chen, Y. F. Huang

*此作品的通信作者

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81 引文 斯高帕斯（Scopus）

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Engineering

Chemistry

Material Science

Immunology and Microbiology

Chemical Engineering