摘要
For high-voltage output driver, the lateral DMOS (LDMOS) is often used for both output function operation and self-protection against electrostatic discharge (ESD) events. In this work, a new structure of LDMOS output device with embedded SCR has been proposed and verified in a 0.25-μm 60-V BCD process. This new structure, with additional p+ and n+ implantation regions added between the drain contact and poly-gate of LDMOS, can keep it stably in the high-current holding region after snapback. By using this structure, the LDMOS can provide high enough self-protected ESD robustness for applications in the high-voltage output drivers.
| 原文 | English |
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| 頁面 | 116-119 |
| 頁數 | 4 |
| DOIs | |
| 出版狀態 | Published - 27 5月 2013 |
| 事件 | 2013 IEEE International Symposium on Next-Generation Electronics, ISNE 2013 - Kaohsiung, 台灣 持續時間: 25 2月 2013 → 26 2月 2013 |
Conference
| Conference | 2013 IEEE International Symposium on Next-Generation Electronics, ISNE 2013 |
|---|---|
| 國家/地區 | 台灣 |
| 城市 | Kaohsiung |
| 期間 | 25/02/13 → 26/02/13 |