摘要
For high-voltage output driver, the lateral DMOS (LDMOS) is often used for both output function operation and self-protection against electrostatic discharge (ESD) events. In this work, a new structure of LDMOS output device with embedded SCR has been proposed and verified in a 0.25-μm 60-V BCD process. This new structure, with additional p+ and n+ implantation regions added between the drain contact and poly-gate of LDMOS, can keep it stably in the high-current holding region after snapback. By using this structure, the LDMOS can provide high enough self-protected ESD robustness for applications in the high-voltage output drivers.
原文 | English |
---|---|
頁面 | 116-119 |
頁數 | 4 |
DOIs | |
出版狀態 | Published - 27 5月 2013 |
事件 | 2013 IEEE International Symposium on Next-Generation Electronics, ISNE 2013 - Kaohsiung, 台灣 持續時間: 25 2月 2013 → 26 2月 2013 |
Conference
Conference | 2013 IEEE International Symposium on Next-Generation Electronics, ISNE 2013 |
---|---|
國家/地區 | 台灣 |
城市 | Kaohsiung |
期間 | 25/02/13 → 26/02/13 |