Selective oxygen-plasma-etching technique for the formation of ZnO-FTO heterostructure nanotubes and their rectified photocatalytic properties

Keyphrases

• Heterostructure 100%
• Photocatalytic Properties 100%
• Etching Process 100%
• Nanotubes 100%
• Oxygen Plasma Etching 100%
• Nanoparticles 50%
• UV Illumination 50%
• Photoresponse Characteristics 50%
• Order of Magnitude 50%
• Dissociation 50%
• Carrier Concentration 50%
• Photocurrent 50%
• ZnO Nanorod Arrays 50%
• Dark Current 50%
• Oxygen Plasma 50%
• Solar Cell Applications 50%
• ZnO Nanorods 50%
• Hollow 50%
• Concentration Ratio 50%
• X-ray Photoelectron Spectroscopy Analysis 50%
• Selective Etching 50%
• Three-dimensional Electrode 50%
• Nanotube Arrays 50%
• Evolution Mechanism 50%
• Hydroxyl Functional Group 50%
• Spray Pyrolysis 50%
• Oxygen Plasma Treatment 50%
• Outward Diffusion 50%
• Surface Conductive Layer 50%
• Chemical Solution Process 50%
• On-off Cycles 50%
• OH Concentration 50%

Material Science

• Heterojunction 100%
• ZnO 100%
• Plasma Etching 100%
• Nanotube 100%
• Nanorod 40%
• Surface (Surface Science) 40%
• X-Ray Photoelectron Spectroscopy 20%
• Solar Cell 20%
• Carrier Concentration 20%
• Nanoparticle 20%
• Solution (Chemistry) 20%
• Spray Pyrolysis 20%