Selective growth of carbon nanotube on scanning probe tips by microwave plasma chemical vapor deposition

Fu-Ming Pan*, Y. B. Liu, Edward Yi Chang, C. Y. Chen, T. G. Tsai, M. N. Chang, Jeng-Tzong Sheu

*此作品的通信作者

研究成果: Article同行評審

4 引文 斯高帕斯(Scopus)

摘要

Selective growth of carbon nanotube on scanning probe tips was investigated using microwave plasma chemical vapor deposition (MPCVD). A local electric field induced oxidation (EFIO) method was used to define the cobalt catalyst domain on the tip apex of a commercial silicon based atomic force microscope (AFM). It was observed that wet etching effectively removed the oxidized TiN cap layer from the tip apex which was used to produce cobalt catalyst domain. High resolution atomic force microscopy images of a silica trench pattern were also demonstrated using the carbon nanotube tip.

原文English
頁(從 - 到)90-93
頁數4
期刊Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
22
發行號1
DOIs
出版狀態Published - 2004

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