Selective growth of carbon nanotube on scanning probe tips was investigated using microwave plasma chemical vapor deposition (MPCVD). A local electric field induced oxidation (EFIO) method was used to define the cobalt catalyst domain on the tip apex of a commercial silicon based atomic force microscope (AFM). It was observed that wet etching effectively removed the oxidized TiN cap layer from the tip apex which was used to produce cobalt catalyst domain. High resolution atomic force microscopy images of a silica trench pattern were also demonstrated using the carbon nanotube tip.
|頁（從 - 到）||90-93|
|期刊||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|出版狀態||Published - 1 1月 2004|