Selective deposition of gold nanoparticles on SiO 2 /Si nanowire

Jeng-Tzong Sheu*, C. C. Chen, P. C. Huang, M. L. Hsu


研究成果: Conference article同行評審

11 引文 斯高帕斯(Scopus)


We demonstrate selective deposition of citrate-passivated gold nanoparticles onto silicon dioxide patterns. Further, selective deposition of gold nanoparticles on the oxides, generated by scanning probe lithography (SPL), surface of silicon nanowire is achieved. Main methodology is to form H-terminated silicon surface and hydroxyl group on SiO 2 sample surface, then link amino function group only on SiO 2 surface by self-assembly mechanism. N-(2-Aminoethyl)-3-aminopropyl-trimethoxysilane (AEAPTMS) pretreated sample was immersed in the gold colloidal solution such that the NH 2 group become protonated forming NH 3+ . The NH 3+ groups provide a negative charge bindable environment for citrate-passivated gold nanoparticles. Impact on different AEAPTMS dilute solvents is also investigated for the performance of selective deposition of gold nanoparticles. It is found that H-terminated sample surface effectively eliminated nonspecific reaction during silanization such that microscale or nanoscale selective deposition of gold nanoparticles is obtainable. The proposed method can be applied in both nanoelectronics and nanobiosensors.

頁(從 - 到)294-299
期刊Microelectronic Engineering
出版狀態Published - 1 3月 2005
事件Proceedings of the 30th International Conference on Micro- and Nano-Engineering -
持續時間: 19 9月 200422 9月 2004


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