Room-temperature oxidation of Ni, Pd, and Pt silicides

A. Cros*, R. A. Pollak, King-Ning Tu

*此作品的通信作者

研究成果: Article同行評審

18 引文 斯高帕斯(Scopus)

摘要

The room-temperature oxidation of Ni, Pd, and Pt silicides has been studied using electron spectroscopy for chemical analysis. It has been found that (1) Si atoms oxidize predominantly, (2) the oxidation of Si is enhanced in the metal-rich silicides, and (3) the growth of the surface oxide layer leaves behind a phase enriched with metal.

原文English
頁(從 - 到)2253-2257
頁數5
期刊Journal of Applied Physics
57
發行號6
DOIs
出版狀態Published - 1 12月 1985

指紋

深入研究「Room-temperature oxidation of Ni, Pd, and Pt silicides」主題。共同形成了獨特的指紋。

引用此