Room-temperature electroluminescence at 1.3 and 1.5 μm from Ge/Si quantum-dot light-emitting diode

Wen-Hao Chang, An Tai Chou, Wen Yen Chen, Hsiang Szu Chang, Tzu Min Hsu, Zingway Pei, Pan Shiu Chen, S. W. Lee, Li Shyue Lai, S. C. Lu, M. J. Tsai

研究成果: Conference contribution同行評審

摘要

We report RT EL from Ge/Si QD light-emitting diodes (LED). The LEDs were fabricated in mesa-type structure, with silicon oxide layer on the top for surface/side wall passivation. Different passivation processes have been employed. We found that the EL intensities are relatively less sensitive to temperature in the range of 80 to 300 K. At RT, an internal quantum efficiency up to 0.015 % has been achieved.

原文English
主出版物標題2003 International Symposium on Compound Semiconductors, ISCS 2003
發行者Institute of Electrical and Electronics Engineers Inc.
頁面129-130
頁數2
ISBN(電子)0780378202
DOIs
出版狀態Published - 2003
事件2003 International Symposium on Compound Semiconductors, ISCS 2003 - San Diego, 美國
持續時間: 25 8月 200327 8月 2003

出版系列

名字IEEE International Symposium on Compound Semiconductors, Proceedings
2003-January

Conference

Conference2003 International Symposium on Compound Semiconductors, ISCS 2003
國家/地區美國
城市San Diego
期間25/08/0327/08/03

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